A Nanopatterning Technique: DUV Interferometry of a Reactive Plasma Polymer.

Autor: Sablon KA; University of Arkansas, Little Rock, USA.
Jazyk: angličtina
Zdroj: Nanoscale research letters [Nanoscale Res Lett] 2009 Jan 21; Vol. 4 (4), pp. 389-390. Date of Electronic Publication: 2009 Jan 21.
DOI: 10.1007/s11671-009-9250-9
Databáze: MEDLINE