| Autor: |
Liedtke A; Department of Physics, University of Hull, Cottingham Road, Hull, HU6 7RX, UK., Lei C, O'Neill M, Dyer PE, Kitney SP, Kelly SM |
| Jazyk: |
angličtina |
| Zdroj: |
ACS nano [ACS Nano] 2010 Jun 22; Vol. 4 (6), pp. 3248-53. |
| DOI: |
10.1021/nn100012g |
| Abstrakt: |
We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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