| Autor: |
Barczewski M; Institute of Nanotechnology, Forschungszentrum Karlsruhe, Karlsruhe Institute of Technology, 76021 Karlsruhe, Germany. matthias.barczewski@int.fzk.de, Walheim S, Heiler T, Blaszczyk A, Mayor M, Schimmel T |
| Jazyk: |
angličtina |
| Zdroj: |
Langmuir : the ACS journal of surfaces and colloids [Langmuir] 2010 Mar 02; Vol. 26 (5), pp. 3623-8. |
| DOI: |
10.1021/la903028x |
| Abstrakt: |
A major challenge in constructive nanolithography is the preservation of the lateral resolution of a monolayer-thick template pattern while amplifying it to a structure with a thickness above 10 nm. So far, the most successful approach to achieve this is surface-initiated polymerization (SIP) from e-beam structured monolayer templates in a multistep process. However, spreading of the polymer on the substrate leads to a rapid line-widening. Therefore, structures with lateral resolutions well below 100 nm and thicknesses above 10 nm (aspect ratio: 0.1) were not reported yet. Our approach of photoinduced, constructive, reversible nanolithography, is based on nanografting within a coumarin-derivative thiol (CDT) solution using the tip of an atomic force microscope (AFM). By photodimerization and the formation of disulfide bonds, the CDT polymerizes in a single-step process. We demonstrate the highest lateral resolution in constructive nanolithography at thicknesses above 10 nm (40 nm lateral resolution at 12 nm thickness, aspect ratio: 0.3). |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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