| Autor: |
Metzger C; Department of Physics, 590 Commonwealth Avenue, The Boston University Photonics Center, 8 Saint Mary's Street, Boston University, Boston, Massachusetts 02215, USA., Rémi S, Liu M, Kusminskiy SV, Castro Neto AH, Swan AK, Goldberg BB |
| Jazyk: |
angličtina |
| Zdroj: |
Nano letters [Nano Lett] 2010 Jan; Vol. 10 (1), pp. 6-10. |
| DOI: |
10.1021/nl901625v |
| Abstrakt: |
Measurements on graphene exfoliated over a substrate prepatterned with shallow depressions demonstrate that graphene does not remain free-standing but instead adheres to the substrate despite the induced biaxial strain. The strain is homogeneous over the depression bottom as determined by Raman measurements. We find higher Raman shifts and Gruneisen parameters of the phonons underlying the G and 2D bands under biaxial strain than previously reported. Interference modeling is used to determine the vertical position of the graphene and to calculate the optimum dielectric substrate stack for maximum Raman signal. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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