| Autor: |
Schubert MF; Future Chips Constellation, Rensselaer Polytechnic Institute, Troy, NY 12180, USA., Mont FW, Chhajed S, Poxson DJ, Kim JK, Schubert EF |
| Jazyk: |
angličtina |
| Zdroj: |
Optics express [Opt Express] 2008 Apr 14; Vol. 16 (8), pp. 5290-8. |
| DOI: |
10.1364/oe.16.005290 |
| Abstrakt: |
Designs of multilayer antireflection coatings made from co-sputtered and low-refractive-index materials are optimized using a genetic algorithm. Co-sputtered and low-refractive-index materials allow the fine-tuning of refractive index, which is required to achieve optimum anti-reflection characteristics. The algorithm minimizes reflection over a wide range of wavelengths and incident angles, and includes material dispersion. Designs of antireflection coatings for silicon-based image sensors and solar cells, as well as triple-junction GaInP/GaAs/Ge solar cells are presented, and are shown to have significant performance advantages over conventional coatings. Nano-porous low-refractive-index layers are found to comprise generally half of the layers in an optimized antireflection coating, which underscores the importance of nano-porous layers for high-performance broadband and omnidirectional antireflection coatings. |
| Databáze: |
MEDLINE |
| Externí odkaz: |
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