Characterization in silicon processing. [electronic resource]
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Jazyk: | angličtina |
Informace o vydání: | [New York, N.Y.] (222 East 46th Street, New York, NY 10017) : Momentum Press, 2010. |
Předmět: |
Silicon
Electric conductors Semiconductor films Surface chemistry Electronic books Epitaxial growth polysilicon silicides Al Cu and W based conductors barrier films thickness determination impurities and defects dopant distributions ULSI processing surface and thin film analysis chemical composition determination microstructure |
Vydání: | 1st ed. |
Druh dokumentu: | Abstracts; Bibliographies; Online; Non-fiction; Electronic document |
Abstrakt: | Abstract: This volume has been written to aid materials users working with silicon-based semiconductor systems. Materials problems arise in all stages of semiconductor device production: research and development of new processes, devices, or integrated circuit technologies; new process equipment definition and new process start-up; operation of state-of-the-art processes in wafer fabrication facilities; and throughout the life of each wafer fabrication process. |
Databáze: | Vybrané kolekce e-knih |
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