Spacer Engineered FinFET Architectures : High-Performance Digital Circuit Applications. [elektronicky zdroj]
| Autor: | Dasgupta, Sudeb |
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| Další autoři: | |
| Jazyk: | angličtina |
| Informace o vydání: | Milton : Taylor & Francis Group, 2017. |
| Předmět: | |
| Vydání: | 1st ed. |
| Druh dokumentu: | Online; Non-fiction; Electronic document |
| Abstrakt: | Summary: This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations. |
| Databáze: | Vybrané kolekce e-knih |
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