Plasma parameters measurement in the plasma-chemical reactors with plasma-jets.

Autor:	Čada, M.
Další autoři:	Hubička, Zdeněk, 1972- Šícha, Miloš, 1930-2012 Churpita, O.
Jazyk:	angličtina
Předmět:	tenké vrstvy plazma (fyzika) thin films plasma (ionized gases) články journal articles Langmuir probe hollow cathode discharge ZnO and LiCoOx thin layers electron temperature electron concentration barrier-torch discharge double Langmuir probe
Druh dokumentu:	Non-fiction
ISSN:	0447-6441
Abstrakt:	Abstract: RF and DC plasma jet sputtering systems were investigated as sources for deposition of ZnO and LiCoOx thin films. Langmuir probe measurement has been employed for ivnestigation of the plasma parameters during in-situ deposition process. Langmuir probe measurement performed during ZnO thin layer preparation at the substrate revealed two groups of electrons with different temperatures in the DC plasma jet. A single roup of electrons was found in the RF plasma jet system for both RF plasma jet depositions of ZnO and LiCoOx films. Electron concentration in the RF jet was found to be about neRF≈5.10(9)-6.10(8) cm(-3) with temperature TeRF ≈2.5 eV - 3.5 eV. In the DC plasma jet, concentration of cold electrons was usually nec≈1.10(9) cm(-3) with temperature Teh≈ 0,5 eV and concentration of hot electrons was neh≈1.10(8) cm(-3) s teplotou Teh≈2 eV - 3.5 eV. Furthermore, we present measurements of the Te in the RF barrier-torch discharge by means of the planar RF-compensated Langmuir probe. The Te was measured at the position of the substrate in the single and multi-torch barrier atmospheric plasma jet systems. The Te was found to be in the interval Te= 3 - 6 eV depending on the applied RF power and system configuration for He as a working gas.
Databáze:	Katalog Knihovny AV ČR
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