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angličtina |
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| Druh dokumentu: |
Kniha |
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Abstract: Subaperture stitching interferometry was originally developed to allow for the full-aperture measurement of large-aperture spheres and flats using commercially available 4” or 6” interferometers and transmission elements. The method was then extended to the measurement of mild aspheric surfaces, by exploiting the local best-fitting and magnification of the high density fringe patterns associated with non-null interferometry. In both cases, advanced stitching algorithms have been developed to automatically compensate for systematic interferometer errors such as reference wavefront and distortion errors. Stitching interferometry also provides for higher lateral spatial resolution than conventional interferometry. Subaperture stitching interferometry has now been extended to the measurement of high-departure aspheres through the use of a variable optical null (VON™) device. The VON can have a variety of realizations that serve to generate an optical wavefront that closely matches the surface of the asphere within a local subaperture. The residual wavefront error is measured with a standard interferometer, and the full-aperture surface profile of the asphere is reconstructed using advanced stitching algorithms. This method allows for the accurate measurement of aspheres with up to 1000 waves of departure from best-fit sphere, without the use of dedicated null lenses. This paper presents the basic principles of subaperture stitching interferometry incorporating a specific VON. |
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Katalog Knihovny AV ČR |
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