Modeling of Dry Development in Bilayer-Resist Process for 140-nm Contact Hole Patterning.
| Autor: | Sung Bo Hwang, Kim, Won D., Edgar, Thomas F. |
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| Zdroj: | IEEE Transactions on Semiconductor Manufacturing. May2002, Vol. 15 Issue 2, p245. 8p. 16 Black and White Photographs, 3 Charts, 4 Graphs. |
| Databáze: | Business Source Ultimate |
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