Multilevel diffractive elements in SiO2 by electron beam lithography and proportional etching with analogue negative resist.
| Autor: | Laakkonen, Pasi, Lautanen, Jari, Kettunen, Ville, Turunen, Jari, Schirmer, Matthias |
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| Zdroj: | Journal of Modern Optics. 07/10/99, Vol. 46 Issue 8, p1295-1307. 13p. 3 Black and White Photographs, 4 Charts, 6 Graphs. |
| Databáze: | Business Source Ultimate |
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