Investigation of Metallized Source/Drain Extension for High-Performance Strained NMOSFETs.
| Autor: | Tzu-Juei Wang1, Chih-Hsin Ko2, Hong-Nien Lin2, Shoou-Jinn Chang1 changsj@mail.ncku.edu.tw, Sap-Lein Wu3, Ta-Ming Kuan2, Wen-Chin Lee2 |
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| Zdroj: | IEEE Transactions on Electron Devices. Nov2008, Vol. 55 Issue 11, p3221-3226. 6p. |
| Databáze: | Business Source Ultimate |
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