The Performance and Reliability of PMOSFET's with Ultrathin Silicon Nitride/Oxide Stacked Gate Dielectrics with Nitrided Si-SiO... Interfaces Prepared by Remote Plasma Enhanced CVD and Post-...
| Autor: | Wu, Yider, Lucovsky, Gerald |
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| Zdroj: | IEEE Transactions on Electron Devices. Jul2000, Vol. 47 Issue 7, p1361. 9p. 3 Black and White Photographs, 12 Graphs. |
| Databáze: | Business Source Ultimate |
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