Maximum Active Concentration of Ion-Implanted Phosphorus During Solid-Phase Epitaxial Recrystallization.
| Autor: | Suzuki, Kunihiro1 suzuki.kunihiro@jp.fujitsu.com, Tada, Yoko1, Kataoka, Yuji1, Kawamura, Kazuo2, Nagayama, Tsutomu3, Nagayama, Susumu4, Magee, Charles W.5, Buyuklimanhi, Temel H.5, Mueller, Dominik Christoph6, Fichtner, Wolfgang6, Zechner, Christoph7 |
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| Zdroj: | IEEE Transactions on Electron Devices. Aug2007, Vol. 54 Issue 8, p1985-1993. 9p. 11 Black and White Photographs, 12 Graphs. |
| Databáze: | Business Source Ultimate |
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