Phosphorus and Boron Ion Implantation Profiles in Molybdenum Gates.
| Autor: | Tada, Yoko1, Suzuki, Kunihiro1 |
|---|---|
| Zdroj: | IEEE Transactions on Electron Devices. Jan2007, Vol. 54 Issue 1, p173-178. 6p. |
| Databáze: | Business Source Ultimate |
| Externí odkaz: |
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| Autor: | Tada, Yoko1, Suzuki, Kunihiro1 |
|---|---|
| Zdroj: | IEEE Transactions on Electron Devices. Jan2007, Vol. 54 Issue 1, p173-178. 6p. |
| Databáze: | Business Source Ultimate |
| Externí odkaz: |
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