Phosphorus and Boron Ion Implantation Profiles in Molybdenum Gates.
Autor: | Tada, Yoko1, Suzuki, Kunihiro1 |
---|---|
Zdroj: | IEEE Transactions on Electron Devices. Jan2007, Vol. 54 Issue 1, p173-178. 6p. |
Databáze: | Business Source Ultimate |
Externí odkaz: |
Autor: | Tada, Yoko1, Suzuki, Kunihiro1 |
---|---|
Zdroj: | IEEE Transactions on Electron Devices. Jan2007, Vol. 54 Issue 1, p173-178. 6p. |
Databáze: | Business Source Ultimate |
Externí odkaz: |