Ferroelectric Thick Film in an Insulator of a Low-Energy Plasma Focus.
Autor: | Sylvester, Gustavo1 gsylvest@cchen.cl, Zambra, Marcelo1, Silva, Patricio1, Moreno, José1 |
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Zdroj: | IEEE Transactions on Plasma Science. Oct2006 Part 1 Of 4, Vol. 34 Issue 5, p1934-1937. 4p. |
Databáze: | Business Source Ultimate |
Externí odkaz: |