Ferroelectric Thick Film in an Insulator of a Low-Energy Plasma Focus.

Autor: Sylvester, Gustavo1 gsylvest@cchen.cl, Zambra, Marcelo1, Silva, Patricio1, Moreno, José1
Zdroj: IEEE Transactions on Plasma Science. Oct2006 Part 1 Of 4, Vol. 34 Issue 5, p1934-1937. 4p.
Databáze: Business Source Ultimate