Targeting 45nm with improved SiON films and extended gate dielectrics.
| Autor: | Cunningham, Kevin L.1, Ahmed, Khaled1, Olsen, Chirs1, Hung, Steve1, Chu, Schubert1, Nouri, Faran1 |
|---|---|
| Zdroj: | Solid State Technology. Jul2006, Vol. 49 Issue 7, p39-44. 4p. |
| Databáze: | Business Source Ultimate |
| Externí odkaz: |
|