Novel Algorithms for Placement of Rectangular Covers for Mask Inspection in Advanced Lithography and Other VLSI Design Applications.

Autor: Chakraborty, Kanad1 kanadc@agere.com, Lvov, Alexey2 lvov@us.ibm.com, Mukherjee, Maharaj3 mmukherj@us.ibm.com
Zdroj: IEEE Transactions on Computer-Aided Design of Integrated Circuits & Systems. Jan2006, Vol. 25 Issue 1, p79-91. 13p.
Databáze: Business Source Ultimate