Quantitative Comparison of Simulation and Experiment Enabling a Lithography Digital Twin.
| Autor: | Xie, Yutong1 (AUTHOR) yx388@cornell.edu, Davaji, Benyamin2 (AUTHOR) b.davaji@northeastern.edu, Chakarov, Ivan3 (AUTHOR) ivan.chakarov@lamresearch.com, Wen, Sandy3 (AUTHOR) sandy.wen@lamresearch.com, Hargrove, Michael3 (AUTHOR) mhargrove54@gmail.com, Fried, David3 (AUTHOR) david.fried@lamresearch.com, Doerschuk, Peter C.1 (AUTHOR) pd83@cornell.edu, Lal, Amit1 (AUTHOR) amit.lal@cornell.edu |
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| Zdroj: | IEEE Transactions on Semiconductor Manufacturing. Nov2024, Vol. 37 Issue 4, p546-552. 7p. |
| Databáze: | Business Source Ultimate |
| Externí odkaz: |
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