DSH to Extend-DSH: Chip-Level Chemical Mechanical Planarization (CMP) Model Upgrade Based on Decoupling Regression Strategy.
| Autor: | Yue, Qian1 (AUTHOR) qianyue@ime.ac.cn, Lan, Chen1 (AUTHOR) chenlan@ime.ac.cn |
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| Zdroj: | IEEE Transactions on Semiconductor Manufacturing. Aug2024, Vol. 37 Issue 3, p329-339. 11p. |
| Databáze: | Business Source Ultimate |
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