Surface science issues in plasma etching.

Autor: Oehrlein, G. S., Doemling, M. F., Kastenmeier, B. E. E., Matsuo, P. J., Rueger, N. R., Schaepkens, M., Standaert, T. E. F. M.
Zdroj: IBM Journal of Research & Development. Jan-Mar99, Vol. 43 Issue 1/2, p181. 17p. 6 Diagrams, 13 Graphs.
Databáze: Business Source Ultimate