Advanced Gate Etching for Accurate CD Control for 130-nm Node ASIC Manufacturing.
| Autor: | Nagase, Masatoshi1 masatoshi.nagase@necel.com, Tokashiki, Ken1 |
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| Zdroj: | IEEE Transactions on Semiconductor Manufacturing. Aug2004, Vol. 17 Issue 3, p281-284. 5p. |
| Databáze: | Business Source Ultimate |
| Externí odkaz: |
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