A MOSFET Fabrication Using a Maskless Lithography System in Clean-Localized Environment of Minimal Fab.
| Autor: | Khumpuang, Sommawan1, Hara, Shiro1 |
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| Zdroj: | IEEE Transactions on Semiconductor Manufacturing. Aug2015, Vol. 28 Issue 3, p393-398. 6p. |
| Databáze: | Business Source Ultimate |
| Externí odkaz: |
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