Epitaxial cobalt silicide formation using a Co/TiSix bilayer on Si (1 0 0) by sputtering

Autor: Jeong, Jin Jung1, Lim, Jongmin1, Lee, Chongmu cmlee@inha.ac.kr
Zdroj: Surface & Coatings Technology. Jul2003, Vol. 171 Issue 1-3, p6. 5p.
Databáze: Academic Search Ultimate