Rate of localized gas discharge etching of silicon.

Autor: Abramov, A.1 AbramovVGASU@Yandex.ru, Pankratova, E.1, Surovtsev, I.1
Zdroj: Technical Physics. Oct2014, Vol. 59 Issue 10, p1452-1456. 5p.
Databáze: Academic Search Ultimate
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