Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition.
| Autor: | Kim, Woo ‐ Hee1,2, Kim, Min ‐ Kyu1, Oh, Il ‐ Kwon1, Maeng, Wan Joo3, Cheon, Taehoon4, Kim, Soo ‐ Hyun4, Noori, Atif5, Thompson, David5, Chu, Schubert5, Kim, Hyungjun1, Dunn, B. |
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| Zdroj: | Journal of the American Ceramic Society. Apr2014, Vol. 97 Issue 4, p1164-1169. 6p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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