Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL).

Autor:	Schmidt, Christoph1, Smolarczyk, Marek2, Gomer, Ludmilla2, Hillmer, Hartmut2, Ehresmann, Arno1 ehresmann@physik.uni-kassel.de
Zdroj:	Nuclear Instruments & Methods in Physics Research Section B. Mar2014, Vol. 322, p59-62. 4p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu Full Text from ScienceDirect