Impact of the forming conditions and electrode metals on read disturb in HfO2-based RRAM.

Autor: Lorenzi, P.1 lorenzi@die.uniroma1.it, Rao, R.1, Prifti, T.1, Irrera, F.1
Zdroj: Microelectronics Reliability. Sep2013, Vol. 53 Issue 9-11, p1203-1207. 5p.
Databáze: Academic Search Ultimate