Surface characteristics of etched parylene-C films for low-damaged patterning process using inductively-coupled O2/CHF3 gas plasma.
| Autor: | Ham, Yong-Hyun1, Shutov, Dmitriy Alexandrovich2, Kwon, Kwang-Ho1 kwonkh@korea.ac.kr |
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| Zdroj: | Applied Surface Science. May2013, Vol. 273, p287-292. 6p. |
| Databáze: | Academic Search Ultimate |
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