Boron electrical activation in dual B[sup +] + N[sup +] and B[sup +] + Ar[sup +] ion-implanted silicon.
| Autor: | Odzhaev, V. B., Popok, V. N., Prosolovich, V. S., Hnatowicz, V. |
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| Zdroj: | Applied Physics A: Materials Science & Processing. 1996, Vol. 62 Issue 4, p355. 4p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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