Effects of He (90%)/H2 (10%) plasma treatment on electric properties of low dielectric constant SiCOH films

Autor: Kim, Hoonbae1 ddasinbab@naver.com, Ha, Myung Hoon1, Jung, Donggeun1 djung@skku.ac.kr, Chae, Heeyeop2 hchae@skku.edu, Kim, Hyoungsub3 hsubkim@skku.edu
Zdroj: Materials Research Bulletin. Oct2012, Vol. 47 Issue 10, p3008-3010. 3p.
Databáze: Academic Search Ultimate
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