Reactive R.F. magnetron sputtering deposition of WO3 thin films
| Autor: | Lemire, Céline1, Lollman, Dave B.B. dave.lollman@L2MP.u-3mrs.fr, Al Mohammad, Ahmad, Gillet, Eveline1, Aguir, Khalifa1 |
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| Zdroj: | Sensors & Actuators B: Chemical. Apr2002, Vol. 84 Issue 1, p43. 6p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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