Behaviors of electron and negative-ion densities in low-pressure high-density inductively coupled plasmas of SF6, NF3, CF4, and C4F8 gases diluted with Ar
| Autor: | Kono, Akihiro1 kono@nuee.nagoya-u.ac.jp, Konishi, Masahito2, Kato, Kenji2 |
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| Zdroj: | Thin Solid Films. Mar2002, Vol. 407 Issue 1/2, p198. 6p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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