On the epitaxy of aluminum nitride on silicon substrates in a chloride–hydride process.
Autor: | Efimov, A. N., Lebedev, A. O., Tsaregorodtsev, A. M. |
---|---|
Zdroj: | Technical Physics Letters. Oct98, Vol. 24 Issue 10, p810. 3p. |
Databáze: | Academic Search Ultimate |
Externí odkaz: |