A Comparative Study of the Atomic Hydrogen Penetration into Thin Vanadium Films and Silicon Oxide–Gallium Arsenide Structures.

Autor: Bozhkov, V. G., Kagadeı, V. A., Proskurovskiı, D. I., Romas’, L. M.
Zdroj: Technical Physics Letters. Oct2000, Vol. 26 Issue 10, p926. 3p.
Databáze: Academic Search Ultimate