Bolometric properties of silicon thin-film structures fabricated by plasmachemical vapor-phase deposition.

Autor:	Zerov, V. Yu., Kulikov, Yu. V., Malyarov, V. G., Feoktistov, N. A., Khrebtov, I. A.
Zdroj:	Technical Physics Letters. Jun97, Vol. 23 Issue 6, p481. 3p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu