Stability of La2O3 and GeO2 passivated Ge surfaces during ALD of ZrO2 high-k dielectric
| Autor: | Bethge, O.1 ole.bethge@tuwien.ac.at, Henkel, C.1, Abermann, S.2, Pozzovivo, G.1, Stoeger-Pollach, M.3, Werner, W.S.M.4, Smoliner, J.1, Bertagnolli, E.1 |
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| Zdroj: | Applied Surface Science. Feb2012, Vol. 258 Issue 8, p3444-3449. 6p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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