Heterolytic dissociation under hot-electron bombardment of the silanic bond at the Si-SiO[sub 2] interface.
Autor: | Cerofolini, G.F., Re, N. |
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Zdroj: | Applied Physics A: Materials Science & Processing. 2002, Vol. 74 Issue 5, p599. 5p. |
Databáze: | Academic Search Ultimate |
Externí odkaz: |