Effects of the substrate temperature on the deposition of thin SiOx films by atmospheric pressure microwave plasma torch (TIA)
| Autor: | Landreau, Xavier xavier.landreau@ensil.unilim.fr, Dublanche-Tixier, Christelle, Jaoul, Cédric, Le Niniven, Christophe, Lory, Nicolas, Tristant, Pascal |
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| Zdroj: | Surface & Coatings Technology. Jul2011 Supplement 2, Vol. 205, pS335-S341. 0p. |
| Databáze: | Academic Search Ultimate |
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