Mitigating the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering
| Autor: | Greczynski, G. grzgr@ifm.liu.se, Jensen, J., Hultman, L. |
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| Zdroj: | Thin Solid Films. Jul2011, Vol. 519 Issue 19, p6354-6361. 8p. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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