Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride.
| Autor: | Harris, H., Biswas, N., Temkin, H., Gangopadhyay, S., Strathman, M. |
|---|---|
| Zdroj: | Journal of Applied Physics. Dec2001, Vol. 90 Issue 11, p5825. 7p. 1 Chart, 11 Graphs. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
|