Reflection absorption infrared spectroscopy during atomic layer deposition of HfO2 films from tetrakis(ethylmethylamido)hafnium and water
Autor: | Sperling, Brent A. brent.sperling@nist.gov, Kimes, William A.1, Maslar, James E.1 |
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Zdroj: | Applied Surface Science. Jun2010, Vol. 256 Issue 16, p5035-5041. 7p. |
Databáze: | Academic Search Ultimate |
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