Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams

Autor: Mashita, T. mashita@incub.u-hyogo.ac.jp, Toyoda, N.1, Yamada, I.1
Zdroj: Applied Surface Science. Nov2009, Vol. 256 Issue 4, p1106-1109. 4p.
Databáze: Academic Search Ultimate