Cluster size dependence of SiO2 thin film formation by O2 gas cluster ion beams
Autor: | Mashita, T. mashita@incub.u-hyogo.ac.jp, Toyoda, N.1, Yamada, I.1 |
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Zdroj: | Applied Surface Science. Nov2009, Vol. 256 Issue 4, p1106-1109. 4p. |
Databáze: | Academic Search Ultimate |
Externí odkaz: |