Comparison of Isoelectronic 8-HOG and 8-NH2-G Derivatives in Redox Processes.
| Autor: | Kaloudis, Panagiotis1,2, D'Angelantonio, Mila1, Guerra, Maurizio1, Spadafora, Marie1, Cismaş, Crina2,3, Gimisis, Thanasis2, Mulazzani, Quinto G.1, Chatgilialoglu, Chryssostomos1 chrys@isof.cnr.it |
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| Zdroj: | Journal of the American Chemical Society. 11/4/2009, Vol. 131 Issue 43, p15895-15902. 8p. |
| Databáze: | Academic Search Ultimate |
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