Large area SiH4/H2 VHF plasma produced at high pressure using multi-rod electrode

Autor: Yamauchi, Yasuhiro1, Takeuchi, Yoshiaki2, Takatsuka, Hiromu1, Kai, Yuichi3, Muta, Hiroshi3, Kawai, Yoshinobu4 kawai@aees.kyushu-u.ac.jp
Zdroj: Surface & Coatings Technology. Aug2008, Vol. 202 Issue 22/23, p5668-5671. 4p.
Databáze: Academic Search Ultimate