Reaction mechanisms during plasma-assisted atomic layer deposition of metal oxides: A case study for Al2O3.

Autor:	Heil, S. B. S.1, van Hemmen, J. L.1, van de Sanden, M. C. M.1, Kessels, W. M. M.1
Zdroj:	Journal of Applied Physics. May2008, Vol. 103 Issue 10, p103302. 14p. 1 Diagram, 12 Graphs.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu