Spectroscopic system for controlling gas flow and impurity content during magnetron deposition of films.
| Autor: | Burmakov, A.1 burmakov@bsu.by, Kuleshov, V.1 |
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| Zdroj: | Journal of Applied Spectroscopy. May2007, Vol. 74 Issue 3, p459-463. 5p. |
| Databáze: | Academic Search Ultimate |
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