Growth behavior and surface topography of different silane coupling agents adsorbed on the silicon dioxide substrate (0001) for vapor phase deposition.
| Autor: | Chujiang Cai1, Zhigang Shen1 shenzhg@buaa.edu.cn, Shulin Ma1, Yushan Xing1 |
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| Zdroj: | Journal of Materials Science. Aug2007, Vol. 42 Issue 15, p6108-6116. 9p. 2 Color Photographs, 2 Diagrams, 7 Graphs. |
| Databáze: | Academic Search Ultimate |
| Externí odkaz: |
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