Characterization of free-standing GaN substrate grown through hydride vapor phase epitaxy with a TiN interlayer

Autor: Wei, T.B. tbwei@semi.ac.cn, Duan, R.F.1, Wang, J.X.1, Li, J.M.1, Huo, Z.Q.1, Ma, P.1, Liu, Zh.1, Zeng, Y.P.1
Zdroj: Applied Surface Science. Jul2007, Vol. 253 Issue 18, p7423-7428. 6p.
Databáze: Academic Search Ultimate