Single-wafer process for improved metal contact hole cleaning.

Autor:	Jae Yong Park, Han Mu Kim, Jong Kook Song, Won Ho Cho, Eun Su Rho, Archer, Leo
Zdroj:	Solid State Technology. May2007, Vol. 50 Issue 5, p50-52. 3p.
Databáze:	Academic Search Ultimate
Externí odkaz:	Zobrazit plný text záznamu